Oppression and Lies
Si Gross
Oppression and Lies was made as a response to news stories about the 2011 revolution in Egypt.
It was a first for Egyptians using technology to break through government propaganda and internet blocking to stay connected with the rest of the world and broadcast the events happening in Cairo. Citizens in Egypt used technoloy that was developed by Falun Gong practitioners in China to break through the great firewall of China.
Limited Edition total of 100 giclee prints in 1 size on Hahnemüle Photorag 308 gsm weight.
Super matt finish of Hahnemüle Photorag The paper gives muted blacks with even colour reproduction, and excellent detail. The surface has minimal texture with a chalky smooth cotton feel which creates smooth colour gradients. It has a delicate surface, so we recommend extra care when handling. Photorag is suitable for mounting but its cotton texture means edges can fray if not carefully handled.
Si Gross
printed on Giclée Hahnemühle Photo Rag